A plasma generator with a hollow electrode connected to a venturi pump which draws a portion of the gas out of the arc chamber in a direction away from the workpiece to stabilize a molten-metal pool formed by the plasma generator. The withdrawn portion of the gas is recycled to the region around the plasma arc between the arc chamber and the workpiece.

An apparatus for generation of dense ion-electron plasma. Ions are accelerated from an ion source of the apparatus through an electron emitting filament thereof. Electrons from the rear of the filament are abstracted to the positive ions and the combination forms a moving plasma with ions and electrons of equal velocity, the plasma forming a concentrated beam utilized for striking a desired target.

A plasma processor comprising a plasma generating chamber which has a plasma outflow port, an evacuated plasma processing chamber which receives therein a member to be processed, such as a semiconductor substrate, and coaxial magnet means to form coaxial magnetic fields for transporting plasma from the plasma outflow port of the plasma generating chamber to the member to be processed, the distance between the plasma outflow port and the member to be processed being made shorter than the mean fre...

Aluminum films on a semiconductor surface are etched in a carbon tetrachloride glow discharge. Typical etch rates are 2000-3000 A/min. The addition of 15% ammonia to the plasma prevents HCl formation when the etched material is exposed to air. This process provides a more easily controlled process for the manufacture of high density integrated circuits.

Two arrays of main X and Y electrodes are juxtaposed with two arrays of auxiliary electrodes in two parallel plane respectively. Two half illumination or extinction pulses less in magnitude than a discharge voltage across the opposite arrays and opposite in polarity are applied to selected ones of the X and Y electrodes to initiate or terminate an electric discharge or discharges across them. A pulse train including positive pulses alternating negative pulses is applied across the arrays of auxi...

The present invention relates to an improved process for the production of a deficient citrated plasma useful in the clinical laboratory as a control plasma for the testing of clotting function, and particularly, in patients who are on oral anticoagulant thereapy.

An electrically neutral, D.C.-induced cold plasma is used to cauterize tissue in the vicinity of a surgical incision. The incision may itself be formed by such a plasma.

In plasma welding apparatus controls are provided which regulate the rates of increasing and decreasing the welding parameters e.g., welding current, gas flow and wire feed to prevent the formations of craters in the weld at the end of a welding run. Improved welds are formed if the wire feed rate is increased prior to the start of the decrease in welding current but after the gas flow to the plasma arc has begun to decrease.

A method for forming on a substrate a relatively thick, densified, essentially non-porous, fine-grained layer of a non-conductive material. The method comprises the steps of vapor depositing onto such substrate a starting material while simultaneously bombarding the substrate with ions of a preselected gas. During the process, the substrate is disposed in the atmosphere of a preselected gas, and an RF field is established between the substrate and an opposing electrode structure to produce a pla...

A plasma kiln with a horizontal cristallizer moved within reach of a plasma torch, provided with parallel supply conductors of electric current to both ends of the cristallizer and with observation means of the cristallizer connected to the supply of the working gas of the plasma torch.